Web(4)硅的.制备及提纯:SiO2 2C=Si CO↑ , Si 2C12=SiC14 SiC14 2H2=Si 4HC1 (5)硅的氧化物SiO2: ①原子晶体,熔点高、硬度大 ②酸性氧化物:但不溶于水,也不与水反应 ③与氢氟酸反应:SiO2 4HF=SiF4 ↑ 2H2O ④光导纤维的主要原抖,制造石英玻璃等。 WebFirstly, SiC14 concentration in the non-oxidizing gas atmo-shere in the CVD treatment is specified to be 5 to 35% in molar fraction, and }n such an atmosphere the steel strip is continu-ously treated by CVD. If SiC14 were less than 5% in the atmosphere, ...
工业硅提纯(工业硅冶炼工艺流程) - 我玩教育
WebSilicon reacts with oxygen to form Si02 and with chlorine to form SiC14 Table 1 shows the melting points of Si02 and SiC14 Table 1 Compound Si02 SiC14 Melting point I oc 1710 —69 Explain, in terms of structure and bonding, why Si02 has a very high melting point but SiC14 has a very low melting point. [4 marks] Si02 SiC14 3 WebSilicon tetrachloride (SIC14) can be prepared by heating Si in chlorine gas: Si(s) + 2Cl₂(g)-> SiCl4(1) in one reaction, 0.507 mole of SiC14 is produced. What mass (grams) of molecular chlorine were used in the reaction? Choose the nearest answer. MW SIC14-169.9 g/mol: MW Cl = 35.453g /mol jerry dammers twitter
Solved In the following reaction, oxygen is the excess - Chegg
Web1 day ago · In SiCl4, the electronegativity of the silicon (Si) atom is 1.9 whereas the chlorine (Cl) atom is 3.16. The electronegativity difference between Si and Cl atoms is about 1.26 which is greater than 0.4. Therefore the single bond between Si-Cl is determined to be polar. WebTranscribed Image Text: Silicon tetrachloride (SiC14 ) can be prepared by heating Si in chlorine gas: Si(s) + 2C12(g) -> SiClą(1) In one reaction, 0.507 mole of SICI4 is produced. What mass (grams) of molecular chlorine were used in the reaction? Choose the nearest answer. MW SICI4 = 169.9 %3D g/mol; MW CI = 35.453 g/mol jerry d\u0027s harford road